Spare part kits for vacuum pump systems LABOPORT® SC/SH/SR
Product number:
4686313
Manufacturer:
KNF NEUBERGER GmbH
Packaging information:
Description
Properties
| For: | SC820G |
|---|---|
| Manufacturer Article Number: | 338823 |
| UNSPSC: | 40151502 |
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The combination of speed controlled VARIO® chemistry diaphragm pumps and the new VACUU·SELECT vacuum controller makes the VARIO® select chemistry pumps the ideal solution for chemical processes that require precise vacuum, such as rotary evaporation, vacuum drying or vacuum concentration.High chemical resistance and therefore ideally suited for pumping aggressive gases and vapours.Short process times and smooth running due to optimal setting of the pressure via the VACUU·SELECT controller.The VARIO® technology controls the vacuum precisely and efficiently via motor speed.Power consumption, maintenance and noise are exceptionally low.The outlet catchpot and solvent condenser combine to prevent solvent vapor emissions into the lab, allowing for nearly full recovery of solvents.Country-specific power cord versions available on request.
Vacuum system for 1 rotary evaporator.Application: Rotary evaporation, distillation, central vacuum supplyFlow rate up to 1.21 m³/h / Ultimate vacuum 2 mbar abs.Automatic, precise boiling point detection and boiling point tracking using an integrated ramp functionPPS pump heads in combination with PTFE-coated diaphragms are ideal for aggressive/corrosive gases and vapoursSpeed controlledIntegrated gas ballast valveConnectors for tube: pneumatic ID10 mm, coolants ID8 mm, inert gas ID6 mm
Fully automatic electronic control of cooling surface temperature and fan.Please order mains cable separately.
Suitable for Hei-VAP Core. Fully controllable stand-alone pumping unit including vacuum controller3-stage diaphragm pump is made from chemical-resistant materialHigh suction capacity for fast evacuationPrecise vacuum control avoids bumping and eliminates foaming of your evaporation solutionAutomatic vacuum supply to the process parametersThe pump unit can be combined with a condenser
Vacuum pump systems consisting of chemically resistant diaphragm vacuum pump, base plate, inlet separator and outlet condensor for solvent recovery. The PTFE pump head and the PTFE-coated diaphragm make the vacuum systems suitable for aggressive / corrosive gases and vapours.100 % oil-free transferHigh level of vapor and condensate compatibilityIntegrated gas ballast valve3-color status display (in operation / stand-by / error)Integrated speed controlStart against ultimate vacuum of the pumpModular expandable
Vacuum pump systems consisting of chemically resistant diaphragm vacuum pump, base plate, separator on suction side, high performance condenser on pressure side and vacuum controller for rotary evaporations, distillations and vacuum ovens. Automatic, accurate recognition and monitoring of the boiling point using the integrated ramp function.High recovery ratesWireless controller via Bluetooth for safe operation from outside closed fume hoodsEasy, intuitive control via touchscreen display and rotation knobIntegrated gas ballast valveFour operating modesIntegrated speed controlATEX compliant to (Ex) II 3/-G Ex h IIB+H2 T3 Gc internal atmosphere only
VARIO® Chemistry Pumping Units offer all the advantages of modern control technology and provide excellent possibilities for solvent recovery. They attain an ultimate vacuum down to 0.6mbar. They are exceptionally quiet in operation and entirely oil-free. Inside the pump, vapours and gases only come into contact with fluoroplastics of optimum chemical resistance.VARIO® Chemistry Pumping Units provide vacuum control by adaptation of motor speed. This has clear advantages compared to even the best of two-point control systems. The vacuum is continuously adjusted to actual process requirements, irrespective of apparatus size and vapour volume. Process times are typically shortened by 30%. Solvent recovery next to 100% is supported through continuous evaporation.All VARIO® Chemistry Pumping Units include a chemistry diaphragm vacuum pump and an integrated vacuum controller with display and vacuum sensor.
Suitable for Rotary evaporators Hei-VAP series. Controllable vacuum pumps for digital regulation of the vacuum via operation panel or directly at the unit.High distillation rates and reduced process time by 30 %.Solvent recovery up to 99 %.Pump stops automatically as soon as the set vacuum is reached and reliably holds the vacuum constantIncreased diaphragm performance life due to periods of non-operationLow energy consumptionSignificant noise and vibration reductionThe pumps can be combined with a condenser3-stage diaphragm pumpHigh suction capacity for fastest evacuationEven if the gas ballast valve is open an excellent ultimate vacuum is reached when working with easily condensable vapors. This makes distilling high boiling point solvents such as DMF or DMSO possible at low bath temperatures
Suitable for Rotary evaporators Hei-VAP series. Controllable vacuum pumps for digital regulation of the vacuum via operation panel or directly at the unit.High distillation rates and reduced process time by 30 %.Solvent recovery up to 99 %.Pump stops automatically as soon as the set vacuum is reached and reliably holds the vacuum constantIncreased diaphragm performance life due to periods of non-operationLow energy consumptionSignificant noise and vibration reductionThe pumps can be combined with a condenser2-stage diaphragm pumpRecommended for solvents with low or medium boiling points